Chipmaker's Gambit: How China's 3nm Breakthrough Challenges Global Semiconductor Dominance China's researchers at the Chinese Academy of Sciences have achieved a significant milestone in their pursuit of self sufficiency in advanced chipmaking.
They have successfully developed a path to 3 nanometer chips using older lithography technology, a breakthrough that challenges conventional wisdom about the need for cutting edge tools.
This achievement is particularly noteworthy because it employs deep ultraviolet (DUV) lithography, which deviates from the traditional approach of relying on extreme ultraviolet (EUV) lithography.